R&D Projects
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New plasma-activated ALD system with a unique source of low-temperature plasma
SVCS Process Innovation and ISAC research teams will design together a plasma based ALD and ALEt equipment. The research will start with the standard ALD reactor design produced by ISAC, and plasma generation systems, gas and precursor distribution and controlling skills will be provided by SVCS.
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Experimental development of MOCVD equipments for high temperature growth of A(III)B(V) semiconductors
Experimental development of MOCVD apparatus for high temperature growth of A(III)B(V) semiconductors and applied research of metal-nitrides epitaxial thin film growth
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New design of the production
The major design improvements include smooth lines of the frames that simplify the construction and bring new modern image
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