Vertical Furnaces

Production | R&D

SVCS Vertical Thermal Reactor (VTR) is designed for all standard atmospheric and low pressure CVD processes. VTR is available with several lengths of flat zone for both mass production and R&D application. The single tube set-up with dual boat logistics is optimized for minimum down time as well as  low maintenance costs.

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Typical Applications

  • Annealing
  • Diffusion
  • Wet and Dry oxidation
  • LPCVD

Features

  • Automatic wafer handling system for loading wafers from SMIF or FOUP closed pods
  • Special automatic loading system by SVCS which allows loading wafers from open cassettes and provides an exceptionally small footprint
  • Quartz, SiC or mono-Si boats can be used
  • State of the art modular control system, inhouse designed, highly tailored and inhouse manufactured
  • Top notch components always selected for excelent results and trouble free long life of the furnace equipment
  • Integration of vacuum pump system in cooperation with leading vacuum pump manufacturers

Technical Data

 Wafer size  6″ – 12″ (150 mm – 300 mm)
 Wafer load  25 – 150 wafers/batch
 Heating system  3 or 5 zones
 Flat zone  up to 24″ (600 mm)
 Process temperature  200 oC  –  1230 oC, ± 0.5 oC across flat zone
 Power consumption  50 kW total
 Power supply  3-phase, 400 or 480VAC, 40 – 100 A, 50 or 60 Hz
(system is always adapted to country- specific power supply network)
 Clean dry air  70 – 110 psig (4,8 to 7,6 bar)
 Cooling water  10 – 15 LPM
 Exhaust  210 m³/h

 

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