Vertical Diffusion Furnace

For R&D and production

SVCS Vertical Thermal Reactor (VTR) is designed for all standard atmospheric and low pressure CVD processes. VTR is available with several lengths of flat zone for both mass production and R&D application. The single tube set-up with dual boat logistics is optimized for minimum down time as well as  low maintenance costs.

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Typical Applications

  • Annealing
  • Diffusion
  • Wet and Dry oxidation
  • LPCVD

Features

  • Automatic wafer handling system for loading wafers from SMIF or FOUP closed pods
  • Special automatic loading system by SVCS which allows loading wafers from open cassettes and provides an exceptionally small footprint
  • Quartz, SiC or mono-Si boats can be used
  • State of the art modular control system, inhouse designed, highly tailored and inhouse manufactured
  • Top notch components always selected for excelent results and trouble free long life of the furnace equipment
  • Integration of vacuum pump system in cooperation with leading vacuum pump manufacturers

Technical Data

 Wafer size  6″ – 12″ (150 mm – 300 mm)
 Wafer load  25 – 150 wafers/batch
 Heating system  3 or 5 zones
 Flat zone  up to 24″ (600 mm)
 Process temperature  200 oC  –  1230 oC, ± 0.5 oC across flat zone
 Power consumption  50 kW total
 Power supply  3-phase, 400 or 480VAC, 40 – 100 A, 50 or 60 Hz
(system is always adapted to country- specific power supply network)
 Clean dry air  70 – 110 psig (4,8 to 7,6 bar)
 Cooling water  10 – 15 LPM
 Exhaust  210 m³/h

 

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